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(Print on Demand) Semiconductors, Dielectrics, and Metals for Nanoelectronics and Plasma Nanosciences - PRiME 2020

(Print on Demand) Semiconductors, Dielectrics, and Metals for Nanoelectronics and Plasma Nanosciences - PRiME 2020

Authors/Editors:Durgamadhab Misra, Koji Kita, Stefan De Gendt, Kuniyuki Kakushima, Shadi Dayeh, Steve Kilgore, Peter Mascher, Uros Cvelbar, V. Chaitanya
Product Code:T202009803POD

$90.00 - (Print on Demand) Semiconductors, Dielectrics, and Metals for Nanoelectronics and Plasma Nanosciences - PRiME 2020 $66.63 - (Print on Demand) Semiconductors, Dielectrics, and Metals for Nanoelectronics and Plasma Nanosciences - PRiME 2020

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(Print on Demand) Pits and Pores 9: Nanomaterials - Fabrication, Properties, and Applications - PRiME 2020

(Print on Demand) Pits and Pores 9: Nanomaterials - Fabrication, Properties, and Applications - PRiME 2020

Authors/Editors:P. Granitzer, Rabah Boukherroub, David Lockwood, Hideki Masuda, Sannakaisa Virtanen, Hiroki Habazaki
Product Code:T202009802POD

$90.00 - (Print on Demand) Pits and Pores 9: Nanomaterials - Fabrication, Properties, and Applications - PRiME 2020 $51.18 - (Print on Demand) Pits and Pores 9: Nanomaterials - Fabrication, Properties, and Applications - PRiME 2020

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(Print on Demand) High Temperature Corrosion and Materials Chemistry 14 - PRiME 2020

(Print on Demand) High Temperature Corrosion and Materials Chemistry 14 - PRiME 2020

Authors/Editors:Paul E. Gannon, Makoto Nanko, Jeffrey W. Fergus, E. Opila, Jan Froitzheim, Dev Chidambaram, Torsten Markus, Xingbo Liu
Product Code:T202009801POD

$74.00 - (Print on Demand) High Temperature Corrosion and Materials Chemistry 14 - PRiME 2020 $29.09 - (Print on Demand) High Temperature Corrosion and Materials Chemistry 14 - PRiME 2020

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(Print on Demand) ULSI Process Integration 5 – 212th ECS Meeting

(Print on Demand) ULSI Process Integration 5 – 212th ECS Meeting

Authors/Editors:C. Claeys, H. Iwai, M. Tao, J. Murota, Juin J. Liou, S. Deleonibus
Product Code:T200701106POD

$121.00 - (Print on Demand) ULSI Process Integration 5 – 212th ECS Meeting $76.60 - (Print on Demand) ULSI Process Integration 5 – 212th ECS Meeting

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(Print on Demand) State-of-the-Art Program on Compound Semiconductors 47 (SOTAPOCS 47) -and- Wide-Bandgap Semiconductor Materials and Devices 8 – 212th ECS Meeting

(Print on Demand) State-of-the-Art Program on Compound Semiconductors 47 (SOTAPOCS 47) -and- Wide-Bandgap Semiconductor Materials and Devices 8 – 212th ECS Meeting

Authors/Editors:J. Wang, J. Kim, H. C. Kuo, E. Stokes, J. Bardwell, G. Hunter, J. Brown
Product Code:T200701105POD

$104.00 - (Print on Demand) State-of-the-Art Program on Compound Semiconductors 47 (SOTAPOCS 47) -and- Wide-Bandgap Semiconductor Materials and Devices 8 – 212th ECS Meeting $63.20 - (Print on Demand) State-of-the-Art Program on Compound Semiconductors 47 (SOTAPOCS 47) -and- Wide-Bandgap Semiconductor Materials and Devices 8 – 212th ECS Meeting

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(Print on Demand) Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes 7 -plus- Analytical Techniques for Semiconductor Materials and Process Characterization 5 (ALTECH 2007) – 212th ECS Meeting

(Print on Demand) Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes 7 -plus- Analytical Techniques for Semiconductor Materials and Process Characterization 5 (ALTECH 2007) – 212th ECS Meeting

Authors/Editors:D. K. Schroder, L. Fabry, R. Hockett, H. Shimizu, A. Diebold, B. O. Kolbesen, C. L. Claeys, L. Fabry
Product Code:T200701103POD

$121.00 - (Print on Demand) Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes 7 -plus- Analytical Techniques for Semiconductor Materials and Process Characterization 5 (ALTECH 2007) – 212th ECS Meeting $78.60 - (Print on Demand) Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes 7 -plus- Analytical Techniques for Semiconductor Materials and Process Characterization 5 (ALTECH 2007) – 212th ECS Meeting

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(Print on Demand) Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10 – 212th ECS Meeting

(Print on Demand) Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10 – 212th ECS Meeting

Authors/Editors:Takeshi Hattori, Richard E. Novak, Jerzy Ruzyllo, Pascal Besson, Paul Mertens
Product Code:T200701102POD

$109.00 - (Print on Demand) Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10 – 212th ECS Meeting $87.20 - (Print on Demand) Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10 – 212th ECS Meeting

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(Print on Demand) Silicon-on-Insulator Technology and Devices 13 – 211th ECS Meeting

(Print on Demand) Silicon-on-Insulator Technology and Devices 13 – 211th ECS Meeting

Authors/Editors:G. Celler, S. Cristoloveanu, S. Bedell, F. Gámiz, B.-Y. Nguyen, Y. Omura
Product Code:T20070604POD

$105.00 - (Print on Demand) Silicon-on-Insulator Technology and Devices 13 – 211th ECS Meeting $84.00 - (Print on Demand) Silicon-on-Insulator Technology and Devices 13 – 211th ECS Meeting

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(Print on Demand) State-of-the-Art Program on Compound Semiconductors 46 (SOTAPOCS 46) -and- Processes at the Semiconductor/Solution Interface 2 – 211th ECS Meeting

(Print on Demand) State-of-the-Art Program on Compound Semiconductors 46 (SOTAPOCS 46) -and- Processes at the Semiconductor/Solution Interface 2 – 211th ECS Meeting

Authors/Editors:C. O’Dwyer, D. N. Buckley, A. Etcheberry, L.-J. Chou, M. Yoshimoto, M. Overberg, P.-C. Chang
Product Code:T20070602POD

$116.50 - (Print on Demand) State-of-the-Art Program on Compound Semiconductors 46 (SOTAPOCS 46) -and- Processes at the Semiconductor/Solution Interface 2 – 211th ECS Meeting $93.20 - (Print on Demand) State-of-the-Art Program on Compound Semiconductors 46 (SOTAPOCS 46) -and- Processes at the Semiconductor/Solution Interface 2 – 211th ECS Meeting

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(Print on Demand) Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS 3: New Materials, Processes and Equipment – 211th ECS Meeting

(Print on Demand) Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS 3: New Materials, Processes and Equipment – 211th ECS Meeting

Authors/Editors:M. Öztürk, D.-L. Kwong, P. J. Timans, E. P. Gusev, F. Roozeboom, S. J. Koester, H. Iwai
Product Code:T20070601POD

$103.00 - (Print on Demand) Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS 3: New Materials, Processes and Equipment – 211th ECS Meeting $82.40 - (Print on Demand) Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS 3: New Materials, Processes and Equipment – 211th ECS Meeting

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