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Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 5: New Materials, Processes, and Equipment – 215th ECS Meeting

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 5: New Materials, Processes, and Equipment – 215th ECS Meeting

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$91.31 - Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 5: New Materials, Processes, and Equipment

$73.05 - Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 5: New Materials, Processes, and Equipment

ISBN:978-1-60768-059-8
Number of pages:353
Year published:2009
Authors/Editors:V. Narayanan, F. Roozeboom, D-L. Kwong, H. Iwai, E. P. Gusev, P. J. Timans
Event Title:215th ECS Meeting: San Francisco, CA
Format:PDF
Product Code:T200901901
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