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Physics and Technology of High-k Gate Dielectrics 7 – 216th ECS Meeting

Physics and Technology of High-k Gate Dielectrics 7 – 216th ECS Meeting

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Quick Overview:
This issue of ECS Transactions covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility channels, work function and flat-band voltage control, novel and higher permittivity dielectric materials, interface issues, gate stack reliability, DRAM, non-volatile memories, and exploratory applications.
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$103.64 - Physics and Technology of High-k Gate Dielectrics 7

$82.91 - Physics and Technology of High-k Gate Dielectrics 7

ISBN:978-1-60768-093-2
Number of pages:493
Year published:2009
Authors/Editors:Kar, Houssa, Van Elshocht, and Landheer
Event Title:216th ECS Meeting: EuroCVD 17 & SOFC-XI: Vienna, Austria
Format:PDF
Product Code:T200902506
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