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(Print on Demand) Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment (213th ECS Meeting)

(Print on Demand) Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment (213th ECS Meeting)

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$121.00 - (Print on Demand) Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment (213th ECS Meeting)

$83.20 - (Print on Demand) Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment (213th ECS Meeting)

ISBN:9781713819653
Number of pages:474
Year published:2008
Authors/Editors:P. J. Timans, E. P. Gusev, H. Iwai, D. L. Kwong, M. C. Öztürk, F. Roozeboom
Event Title:213th ECS Meeting: Phoenix, Arizona
Format:Print-on-Demand/Softcover
Product Code:T200801301POD
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