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Chemical Mechanical Polishing 10 – 215th ECS Meeting

Chemical Mechanical Polishing 10 – 215th ECS Meeting

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Quick Overview:
The papers included in this issue of ECS Transactions were originally presented in the symposium “Chemical Mechanical Polishing 10”, held during the 215th meeting of The Electrochemical Society, in San Francisco, California from May 24 to 29, 2009.

$36.89 - Chemical Mechanical Polishing 10

Number of pages:135
Year published:2009
Authors/Editors:Banerjee, Obeng, Desai, and Sundaram
Event Title:215th ECS Meeting: San Francisco, CA
Product Code:T200901907
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