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Atomic Layer Deposition Applications 12 – 230th ECS Meeting/PRiME 2016

Atomic Layer Deposition Applications 12 – 230th ECS Meeting/PRiME 2016

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The papers included in this issue of ECS Transactions were originally presented in the symposium “Atomic Layer Deposition Applications 12”, held during the PRiME 2016 joint international meeting of The Electrochemical Society, The Electrochemical Society of Japan, and the Korean Electrochemical Society, with the technical co-sponsorship of the Chinese Society of Electrochemistry, the Electrochemistry Division of the Royal Australian Chemical Institute, the Japan Society of Applied Physics, the Chinese Physical Society Semiconductor Division, and the Semiconductor Physics Division of the Chinese Physics Society. This meeting was held in Honolulu, Hawaii, from October 2-7, 2016.
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$121.57 - Atomic Layer Deposition Applications 12

$97.26 - Atomic Layer Deposition Applications 12

ISBN:978-1-60768-723-8
Number of pages:204
Year published:2016
Authors/Editors:F. Roozeboom, S. De Gendt, J. W. Elam, O. van der Straten, J. Dendooven, C. Liu, and C. Huffman
Event Title:230th ECS Meeting: PRiME 2016: Honolulu, HI
Format:PDF
Product Code:T201607506
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The papers included in this issue of ECS Transactions were originally presented in the symposium “Atomic Layer Deposition Applications 12”, held during the PRiME 2016 joint international meeting of The Electrochemical Society, The Electrochemical Society of Japan, and the Korean Electrochemical Society, with the technical co-sponsorship of the Chinese Society of Electrochemistry, the Electrochemistry Division of the Royal Australian Chemical Institute, the Japan Society of Applied Physics, the Chinese Physical Society Semiconductor Division, and the Semiconductor Physics Division of the Chinese Physics Society. This meeting was held in Honolulu, Hawaii, from October 2-7, 2016.
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