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Chemical Mechanical Polishing 9 – 213th ECS Meeting

Chemical Mechanical Polishing 9 – 213th ECS Meeting

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Quick Overview:
The papers included in this issue of ECS Transactions were originally presented in the symposium “Chemical Mechanical Polishing 9”, held during the 213th meeting of The Electrochemical Society, in Phoenix, Arizona from May 18-23, 2008.


$25.60 - Chemical Mechanical Polishing 9

Number of pages:81
Year published:2008
Authors/Editors:Banerjee, Sundaram, Desai, and Obeng
Event Title:213th ECS Meeting: Phoenix, Arizona
Product Code:T200801304
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