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Plasma Processing 17 – 213th ECS Meeting

Plasma Processing 17 – 213th ECS Meeting

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This issue of ECS Transactions contains papers presented at the International Symposium on Plasma Processing. The symposium, 17th in the series, cosponsored by the Dielectric Science & Technology, Electronics, and Photonics Divisions was held as part of the 213th Meeting of The Electrochemical Society, Inc., in Phoenix, AZ, USA, May 18 - 23, 2008. A total of 14 papers were presented from Belgium, Germany, Italy, Japan, Republic of Korea, Russia, and the USA on topics mainly focused on diagnostics & measurements and etching & deposition processes.


$29.50 - Plasma Processing 17

$23.60 - Plasma Processing 17

Number of pages:79
Year published:2008
Authors/Editors:Mathad, Engelhardt, andHess
Event Title:213th ECS Meeting: Phoenix, Arizona
Product Code:T200801308
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