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Atomic Layer Deposition Applications 4 – 214th ECS Meeting/PRiME 2008

Atomic Layer Deposition Applications 4 – 214th ECS Meeting/PRiME 2008

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Quick Overview:
The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the symposium focus. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties. This issue of the ECS Transactions contains peer reviewed papers presented at the symposium. Breadths of ALD Applications are featured: novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics and a variety of other emerging applications.


$83.50 - Atomic Layer Deposition Applications 4

$66.80 - Atomic Layer Deposition Applications 4

Number of pages:365
Year published:2008
Authors/Editors:Londergan, Bent, De Gendt, Elam, Kang, and van der Straten
Event Title:214th ECS Meeting : 2008 Fall Meeting of ECSJ : PRiME 2008 : Honolulu, Hawaii
Product Code:T200801604
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