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Atomic Layer Deposition Applications 7 – 220th ECS Meeting

Atomic Layer Deposition Applications 7 – 220th ECS Meeting

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Quick Overview:
Atomic layer deposition (ALD) enables precise, ultra-thin, highly conformal coatings over complex topographies with superb composition control. This issue of the ECS Transactions contains peer reviewed papers presented at the Atomic Layer Deposition Applications 7 symposium and covers recent advances in ALD technology such as high throughput coating and emerging applications including photovoltaics and advanced memory devices.

$113.25 - Atomic Layer Deposition Applications 7

$90.60 - Atomic Layer Deposition Applications 7

Number of pages:413
Year published:2011
Authors/Editors:Elam, De Gendt, Londergan, Bent, van der Straten, Delabie, and Roozeboom
Event Title:220th ECS Meeting: Boston, MA
Product Code:T201104102
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